View larger

ISO 23170:2022

M00001772

New product

ISO 23170:2022 Surface chemical analysis - Depth profiling - Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

standard by International Organization for Standardization, 07/01/2022

More details

In stock

$183.00

More info

Full Description

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).